Source Collector Module with Foiltrap

Target groups for use the Foiltrap:

Developers and users of Xe sources in EUV-Lithography

Technical characteristics:

Increasing Lifetime of Source Collector Module

Mitigation of fast Ions in foiltrap in combination with buffer gas

IF-intensity including foiltrap and gas transmission: 25 mW/mm2

The Foiltrap is designed to protect the collector mirror from debris of diodes of Xe-Source.

The rotating concept increases the service life compared to a static version of Foiltrap.

Rotating Foiltrap

for Debris & Contamination Management

Monte Carlo simulation of foiltrap transmission propability of Xe-ions

Entwicklung in Kooperation mit Fraunhofer, gefördert durch das Zentrale Innovationsprogramm Mittelstand

Please inquire about operating conditions and further technical information by email.